An ab initio molecular-orbital study on hydrogen-abstraction reactions at the growing surface of hydrogenated amorphous silicon

Journal of Applied Physics

Volumn 84, Issue 1, 1998, Pages 606-610

  Nakajima, Kenji ^a   Miyazaki, Kaori ^a   Koinuma, Hideomi ^a   Sato, Kota ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b YOKOHAMA NATIONAL UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000044892     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368087     Document Type: Article

References (32)

1. F. J. Kampas and R. W. Griffith, J. Appl. Phys. 52, 1285 (1981).
2. C. Knights, J. P. M. Schumitt, J. Perrin, and G. Guelachvili, J. Chem. Phys. 76, 3414 (1982).
3. A. Matsuda and K. Tanaka, Thin Solid Films 92, 171 (1982).
4. R. M. Roth, K. G. Spears, and G. Wong, Appl. Phys. Lett. 45, 28 (1984).
5. J. P. M. Schumitt, P. Gressin, M. Krishnan, G. de Rosny, and J. Perrin, Chem. Phys. 84, 281 (1984).
6. G. Inoue and M. Suzuki, Chem. Phys. Lett. 105, 641 (1984).
7. G. C. Elenton, J. Chem. Phys. 15, 445 (1947).
8. R. Robertson, D. Hils, H. Chatham, and A. Gallagher, Appl. Phys. Lett. 43, 544 (1983).
9. R. Robertson and A. Gallagher, J. Appl. Phys. 59, 3402 (1986).
10. C. Yamada and E. Hirota, Phys. Rev. Lett. 56, 923 (1986).
11. N. Itabashi, N. Nishiwaki, M. Magane, S. Naito, T. Goto, A. Matsuda, C. Yamada, and E. Hirota, Jpn. J. Appl. Phys., Part 2 29, L505 (1990).
12. K. Sato, Y. Sugiyama, A. Uchiyama, S. Iwabuchi, T. Hirano, and H. Koinuma, Phys. Rev. B 46, 1913 (1992).
13. J. Isoya, S. Yamasaki, H. Ohkusi, and A. Matsuda, Phys. Rev. B 47, 7013 (1993).
14. J. Baum, K. K. Gleason, A. Pines, A. N. Garroway, and J. A. Reimer, Phys. Rev. Lett. 56, 1377 (1986).
15. K. Sato, H. Honna, S. Iwabuchi, T. Hirano, and H. Koinuma, Phys. Rev. B 50, 2675 (1994).
16. F. J. Kampas and R. W. Griffith, AIP Conf. Proc. 73, 1 (1981).
17. A. Matsuda and K. Tanaka, J. Appl. Phys. 60, 2351 (1986).
18. J. W. McIver, Jr. and A. Komornicki, J. Am. Chem. Soc. 94, 2625 (1972).
19. P. Pulay, in Modern Theoretical Chemistry: Applications of Electronic Structure Theory, edited by H. F. Schaefer III (Plenum, New York, 1977), Vol. 4, Chap. 4.
20. C. C. J. Roothan, Rev. Mod. Phys. 23, 69 (1951).
21. C. Møller and M. S. Plesset, Phys. Rev. 46, 618 (1934).
22. M. J. Frisch, G. W. Trucks, M. Head-Gordon, P. M. W. Gill, M. W. Wong, J. B. Foresman, B. G. Johnson, H. B. Schlegel, M. A. Robb, E. S. Replogle, R. Gomperts, J. L. Andres, K. Raghavachari, J. S. Binkley, C. Gonzalez, R. L. Martin, D. J. Fox, D. J. Defrees, J. Baker, J. J. P. Stewart, and J. A. Pople, GAUSSIAN '92 (Gaussian, Inc., Pittsburgh, PA, 1992).
23. S. Glasstone, K. J. Laidler, and H. Eyring, The Theory of Rate Processes (McGraw-Hill, New York, 1941).
24. M. S. Gordon, D. R. Gano, J. S. Binkley, and M. J. Frisch, J. Am. Chem. Soc. 108, 2191 (1986).
25. M. S. Gordon, T. N. Truong, and E. K. Bonderson, J. Am. Chem. Soc. 108, 1421 (1986).
26. S. Oikawa, S. Ohtsuka, and M. Tsuda, Appl. Surf. Sci. 60/61, 29 (1992).
27. K. Nakajima, K. Sato, and H. Koinuma, 9th Symposium on Plasma Science for Materials, Tokyo, Japan, 15 July 1996, SPSM-9 Abstracts of papers, p. 49.
28. K. Nakajima, K. Miyazaki, A. Ohtomo, K. Sato, and K. Koinuma, International Photovoltaic Science and Engineering Conference, Miyazaki, Japan, 11-15 Nov. 1996, Technical Digest of the International PVSEC-9, p. 569.
29. K. Miyazaki, K. Nakajima, K. Sato, and H. Koinuma, 10th Symposium on Plasma Science for Materials, Tokyo, Japan, 11-12 June 1997, SPSM-9 Abstracts of papers, p. 31.
30. K. Miyazaki, K. Nakajima, K. Sato, and H. Koinuma, Thin Solid Films 316, 134 (1998).
31. J. Isoya, S. Yamasaki, H. Ohkushi, A. Matsuda, and K. Tanaka, Phys. Rev. B 47, 7013 (1993).
32. S. Yamasaki, H. Okushi, A. Matsuda, K. Tanaka, and J. Isoya, Phys. Rev. Lett. 64, 756 (1990).