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Volumn 283-287, Issue PART II, 2000, Pages 832-837
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Fatigue behavior and development of microcracks in F82H after helium implantation at 200°C
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0000042966
PISSN: 00223115
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-3115(00)00313-5 Document Type: Article |
Times cited : (14)
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References (13)
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