Surface plasmons and breakdown in thin silicon dioxide films on silicon

Journal of Applied Physics

Volumn 84, Issue 3, 1998, Pages 1430-1438

  Kim, Jong Hyun ^a   Sanchez, Julian J ^a   DeMassa, Thomas A ^a   Quddus, Mohammed T ^a   Smith, David ^b   Shaapur, Farhad ^b   Weiss, Karl ^b   Liu, Chuan H ^c  

^a Arizona State University   (United States)

^b ARIZONA STATE UNIVERSITY   (United States)

^c UNITED MICROELECTRONICS CORPORATION   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000030311     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368178     Document Type: Article

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