Sensitivity and image quality of resists with electron-beam, ion-beam, and optical exposure

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 1413-1419

  Rau, Nicholas N ^a   Neureuther, Andrew R ^a   Ogawa, Taro ^a   Kubena, Randall L ^b   Stratton, Fred P ^b   Fields, Charles H ^b   Willson, C Grant ^c  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Hughes Aircraft Co   (United States)

^c The University of Texas at Austin   (United States)

Author keywords

Chemically amplified; Diffusion; Electron beam; Ion beam; Optical; Resist; Resolution; Sensitivity

Indexed keywords

DIFFUSION; ELECTRONS; IMAGE QUALITY; ION BEAMS; IONS; PHOTORESISTS;

CHEMICALLY-AMPLIFIED; ELECTRON-BEAM; OPTICAL; RESIST; RESOLUTION; SENSITIVITY;

INTEGRATED OPTOELECTRONICS;

EID: 0000011828     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312465     Document Type: Conference Paper

References (8)

1. N. Tam, "Resist mechanisms and models in electron-beam lithography," Ph.D. Thesis, University of California at Berkeley (1991).
2. A. Tritchkov, R. Jonckheere, L Van den hove, "Use of positive and negative chemically amplified resists in electron-beam direct-write lithography," J. Vac. Sci. Technol. B, Vol 13(6), pp. 2986-2993, Nov/Dec 1995.
3. R. Kubena, "Resolution limits of focused-ion-beam resist patterning," Mat. Res. Soc. Symp. Proc. ,Vol. 279, pp. 567-576, 1993.
4. I. Raptis, et.al., "Determination of acid diffusion and energy deposition parameters by point e-beam exposure in chemically amplified resists," Microelectronic Engineering, Vol. 30, pp. 295-299, 1996.
5. M. Zuniga, N. Rau, A. Neureuther, "Modeling of the patterning process with chemically-amplified resists," 10th Microprocess Conference, Nagoya, Japan, 1997.
6. G. R. Brewer, Electron-Beam in Microelectronic Fabrication, ed. J. S. Greeneich, p. 94, 1980.
7. J. Byers, J. Petersen, J. Stutevant, "Calibration of chemically amplified resist models," Proceedings of SPIE, Vol. 2724, p. 156, 1996.
8. M Zuniga, N. Rau, A. Neureuther, "Application of a general reaction/diffusion model to emerging materials with extension to non-actinic exposure," Proceedings of SPIE, Vol. 3049, pp. 256-268, 1997.