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Volumn 53, Issue 1-3, 1996, Pages 249-255

Sealed-cavity resonant microbeam accelerometer

Author keywords

Accelerometers; Microelectromechanical systems; Micromachining; Resonant sensors; Sensors

Indexed keywords


EID: 0000010862     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/0924-4247(96)01135-1     Document Type: Article
Times cited : (40)

References (13)
  • 1
    • 84981641754 scopus 로고
    • Superflex: A synergistic combination of vibrating beam and quartz flexure accelerometer technology
    • B.L. Norling, Superflex: a synergistic combination of vibrating beam and quartz flexure accelerometer technology, J. Inst. Navigation, 34 (1987-1988) 337-353.
    • (1987) J. Inst. Navigation , vol.34 , pp. 337-353
    • Norling, B.L.1
  • 3
    • 30244564688 scopus 로고    scopus 로고
    • RBA500 Product Information, AlliedSignal Corp., Redmond, WA
    • RBA500 Product Information, AlliedSignal Corp., Redmond, WA.
  • 8
    • 30244459733 scopus 로고
    • Electrostatically force-rebalanced silicon accelerometer
    • K. Warren, Electrostatically force-rebalanced silicon accelerometer, J. Inst. Navigation, 38 (1991) 91-99.
    • (1991) J. Inst. Navigation , vol.38 , pp. 91-99
    • Warren, K.1
  • 12
    • 0018506572 scopus 로고
    • The controlled etching of silicon in catalyzed ethylenediamine-pyrocatechol-water solutions
    • A. Reisman, M. Berkenblit, S.A. Chan, F.B. Kaufman and D.C. Green, The controlled etching of silicon in catalyzed ethylenediamine-pyrocatechol-water solutions, J. Electrochem. Soc., 126 (1979) 1406-1415.
    • (1979) J. Electrochem. Soc. , vol.126 , pp. 1406-1415
    • Reisman, A.1    Berkenblit, M.2    Chan, S.A.3    Kaufman, F.B.4    Green, D.C.5
  • 13
    • 0024647478 scopus 로고
    • Study of electrochemical etch-stop for high-precision thickness control of silicon membranes
    • B. Kloeck, S. Collins, N. de Rooij and R. Smith, Study of electrochemical etch-stop for high-precision thickness control of silicon membranes, IEEE Trans. Electron. Dev., 36 (1989) 663-669.
    • (1989) IEEE Trans. Electron. Dev. , vol.36 , pp. 663-669
    • Kloeck, B.1    Collins, S.2    De Rooij, N.3    Smith, R.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.