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Plasma Chemistry and Plasma Processing

Volumn 1, Issue 2, 1981, Pages 201-215

DC plasma etching of silicon by sulfur hexafluoride. Mass spectrometric study of the discharge products

(2) Wagner, John J a Brandt, Werner W a

a UNIVERSITY OF WISCONSIN MILWAUKEE (United States)

Author keywords

mass spectroscopy; SF6 discharge; silicon

Indexed keywords

EID: 0000002852 PISSN: 02724324 EISSN: 15728986 Source Type: Journal
DOI: 10.1007/BF00564581 Document Type: Article

Times cited : (36)

References (19)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.